| Author |
Title |
Publication Name |
| Liang-Teck Pang, Kun Qian, Costas J. Spanos and Borivoje Nikolic | Measurement and Analysis of Variability in 45 nm Strained-Si CMOS Technology | IEEE Journal of Solid-State Circuits, Volume 44, Issue 8, Aug. 2009 Page(s):2233 - 2243 |
| M. J. Titus, Dustin G Nest and D. B. Graves | Modelling Vacuum Ultraviolet Photon Penetration Depth and CO bond depletion in 193 nm Photoresist | J. Appl. Phys D: Fast Track Communication (2009) |
| G. Leray, P. Chabert, A.J. Lichtenberg and M.A. Lieberman | Fluid Model of an Electronegative Discharge with Magnetized Electrons and Unmagnetized Ions | J. Phys. D: Appl. Phys. 42 (2009) 194020 |
| Tuck-Boon Chan, Puneet Gupta | On Electrical Modeling of Imperfect Diffusion Patterning | IEEE/ACM International Conference on VLSI Design 2010 |
| Lerong Cheng, Puneet Gupta, and Lei He | On Confidence in Characterization and Application of Variation Models | Assian and South Pacific Design Automation Conference 2010 |
| Tuck-Boon Chan, Rani S. Ghaida, Puneet Gupta | Electrical Modeling of Lithographic Imperfections | IEEE/ACM International Conference on VLSI Design 2010 |
| Jemin Park and Chenming Hu | Air-Spacer MOSFET with Self-Aligned Contact for Future Dense Memories | IEEE Electron Device Letters 2009 |
| M. J. Titus, Dustin G Nest and D. B. Graves | Absolute vacuum ultraviolet flux in inductively coupled plasmas and
chemical modifications of 193 nm photoresist | Appl. Phys. Letters 2009 |
| Kwangok Jeong, Andrew B. Kahng, and Rasit O. Topaloglu | A Framework for Chip-Level Evaluation of Misalignment and Linewidth Error Impacts Across Double Patterning Technology Options | International Workshop on Design for Manufacturability and Yield, 2009 |
| Jan B. Talbot, Fiona M. Doyle and David A. Dornfeld | Particle-Scale Modeling of CMP | ICPT2009, Fukuoka, Japan, Nov. 2009 |
| Kwangok Jeong, Andrew B. Kahng, and Rasit O. Topaloglu | Is Overlay Error More Important Than Interconnect Variations in Double Patterning | Proc. ACM International Workshop on System-Level Interconnect Prediction, 2009 |
| N. Brahma, M.C. Chan, and J.B. Talbot | Effect of Copper CMP Slurry Chemistry on the Rate of Agglomeration of Alumina Particles | ECS Transactions, Chemical Mechanical Polishing 10, The Electrochemical Society Meeting, San Francisco, CA (May 2009) |
| Mohit Gupta, Kwangok Jeong, and Andrew B. Kahng | Timing Yield-Aware Color Reassignment and Detailed Placement Perturbation for Double Patterning Lithography | International Conference on Computer-Aided Design 2009 |
| Darsen D. Lu, Chung-Hsun Lin, Shijing Yao, Weize Xiong, Florian Bauer, Cloves R. Cleavelin, Ali M. Niknejad and Chenming Hu | Design of FinFET SRAM Cells using a Statistical Compact Model | 2009 Simulation of Semiconductor Processes and Devices (SISPAD) |
| N. Brahma, M. C. Chan, J. B. Talbot | Effect of Copper CMP Slurry Chemistry on the Rate of Agglomeration of Alumina Particles | ECS Transactions - San Francisco, CA, Volume 19 Chemical Mechanical Polishing 10 |
| Yu Ben, Laurent El Ghaoui, Kameshwar Poolla, Costas J. Spanos | Chance-constrained Digital Circuit Sizing | ESSCIRC 2009 |
| Dominic Reinhard and Puneet Gupta | On Comparing Conventional and Electrically Driven OPC Techniques | SPIE/BACUS Photomask Technology 2009 |
| Rani S. Ghaida and Puneet Gupta | A Framework for Early and Systematic Evaluation of Design Rules | International Conference on Computer-Aided Design (ICCAD) 2009 |
| Rani S. Ghaida, George Torres, and Puneet Gupta | Single-Mask Double-Patterning Lithography | SPIE/BACUS Photomask Technology 2009 |
| Yu Ben, Laurent El Ghaoui, Kameshwar Poolla, Costas J. Spanos | Digital Circuit Sizing via Robust Approximation | 3rd IEEE International Workshop on DFM 2009 |
| Nuo Xu, Xin Sun, Lynn Wang, Andrew Neureuther, Tsu-Jae King Liu | Predictive Compact Modeling for Strain Effects in Nanoscale Transistors | 2009 International Conference on Simulation of Semiconductors Process and Devices (SISPAD) |
| Tripathi, S., Monvoison, A., Dornfeld, D., and Doyle, F. | CMP Modeling as Part of Design for Manufacturing | Proc. ICPT, 2007, Dresden, Germany |
| David Dornfeld | Design for Manufacturing Opportunities in CMP Modeling | Proc.2008 CMP-MIC, Fremont CA, March 2008 |
| David Dornfeld | Opportunities and Challenges to Sustainable Manufacturing and CMP | Proc. MRS Spring Meeting, San Francisco, April 14-16, 2009 |
| Shantanu Tripathi, Fiona M. Doyle, and David A. Dornfeld | Fundamental Mechanisms of Copper CMP – Passivation Kinetics of Copper in CMP Slurry Constituents | 2009 MRS spring meeting |
| Shantanu Tripathi, Seungchoun Choi, Fiona M. Doyle, and David A. Dornfeld | Integrated Tribo-Chemical Modeling of Copper CMP | 2009 MRS spring meeting |
| H. Xu and K. Komvopoulos | A Three-Dimensional Stochastic Analysis of the Lapping Process Used for Magnetic Recording Heads | Proceedings of ASME/STLE International Joint Tribology Conference, Memphis, TN, Paper No. IJTC2009–15176, 2009 |
| H. Xu and K. Komvopoulos | A Probabilistic Analysis of Third-Body Embedment – Implications in Lapping of Magnetic Recording Heads | Proceedings of STLE/ASME International Joint Tribology Conference, Miami, FL, Paper No. IJTC2008–71242, 2008 |
| A. B. Kahng, C.-H. Park, X. Xu and H. Yao | Revisiting the Layout Decomposition Problem for Double Patterning Lithography | Proc. BACUS Symposium on Photomask Technology and Management, 2008 |
| Kwangok Jeong, Andrew B. Kahng | Timing Analysis and Optimization Implications of Bimodal CD Distribution in Double Patterning | Proc. Asia and South Pacific Design Automation Conf., 2009 |
| Eric Chin and Andrew Neureuther | Variability aware timing models for double patterning | SPIE Advanced Lithography 2009 |
| Lynn T.-N. Wang, Liang-Teck Pang, Andrew R. Neureuther, Borivoje Nikolic | Parameter-Specific Electronic Measurement and Analysis of Sources of Variation using Ring Oscillators | SPIE 2009 |
| Lynn T.-N. Wang, Anthony Yeh, Lilly Kem, and Andrew R. Neureuther | Illustration of Illumination Effects on Proximity, Focus Spillover, and Design Rules | SPIE 2009 |
| Neil Brahma, Mike Chan, Jan Talbot | Effect of Copper CMP Slurry Chemistry on the Rate of Agglomeration of Alumina Particles | ECS Transactions - San Fransisco, CA" Volume 19, "Chemical Mechanical Polishing 10", 2009 |
| Marshal Miller, Andrew Neureuther | Analysis and Modeling of Photomask Edge Effects for 3D Geometries and the Effect on Process Window | SPIE Advanced Lithography 2009 |
| Kun Qian, Borivoje Nikolic and Costas J. Spanos | Hierarchical Modeling of Spatial Variability with a 45nm Example | SPIE Advanced Lithography 2009 |
| Qian Ying Tang and Costas Spanos | Interval-value Based Circuit Simulation for Statistical Circuit Design | SPIE Advanced Lithography 2009 |
| Jason Cong, Puneet Gupta, and John Lee | On the Futility of Statistical Power Optimization | Design Automation Conference, Asian and South Pacific, 2009 |
| Lerong Cheng, Puneet Gupta, and Lei He | Accounting for Non-linear Dependence Using Function Driven Component Analysis | Design Automation Conference, Asian and South Pacific, 2009 |
| Lerong Cheng, Puneet Gupta, Costas Spanos, Kun Qian, and Lei He | Physically Justifiable Die-Level Modeling of Spatial Variation in View of Systematic Across Wafer Variability | Design Automation Conference 2009 |
| John Gerling, Zhongsheng Luo, Vorrada Loryuenyong, and Nathan Cheung | ZERO FOOTPRINT OPTICAL SENSOR CELL FOR IN-SITU MONITORING OF MEMBRANE ABSORPTION/DESORPTION OF LIQUIDS | Institute of Biological Engineering Annual Conference March 19-21, 2009 |
| M.A. Lieberman | The Langmuir Isotherm and the Standard Model of Ion-Assisted Etching | Plasma Sources Sci. Technol. 18, 014002 (2009) |
| Carlo Novara, Tyrone L. Vincent and Kameshwar Poolla | Implementation of Input Design for Structured Nonlinear System Identification via Linear IMC Control | 15th IFAC Symposium on System Identification, St. Malo, July 6-8, 2009 |
| Tyrone L. Vincent, Carlo Novara, Kenneth Hsu, and Kameshwar Poolla | Input Design for Structured Nonlinear System Identification | 15th IFAC Symposium on System Identification 2009 |
| Justin Ghan, Ning Ma, Sandipan Mishra, Costas Spanos, Kameshwar Poolla, Norma Rodriguez, Luigi Capodieci | Clustering and pattern matching for an automatic hotspot classification and detection system | SPIE Advanced Lithography 2009 |
| Juliet Rubinstein and Prof. Andrew R. Neureuther | Through-Focus Pattern Matching Applied to Double Patterning | SPIE Advanced Lithography 2009 |
| Changhwan Shin, Xin Sun, and Tsu-Jae King Liu | Study of Random Dopant Fluctuation (RDF) Effects for the Tri-Gate Bulk MOSFET | Transaction on Electron Devices (accepted, to be published in July 2009) |
| Rani S. Ghaida and Puneet Gupta | Design-Overlay Interactions in Metal Double Patterning | SPIE Advanced Lithography 2009 |
| Juliet Rubinstein and Prof. Andrew R. Neureuther | Post-Decomposition Assessment of Double Patterning Layout | SPIE Symposium on Advanced Lithography 2008 |
| Andrew Carlson, Xin Sun, Changhwan Shin, Tsu-Jae King Liu | SRAM yield and performance enhancements with tri-gate bulk MOSFETs | IEEE 2008 Silicon Nanoelectronics Workshop (Honolulu, HI, USA), June 2008. |
| Changhwan Shin, Andrew Carlson, Xin Sun, Kanghoon Jeon, Tsu-Jae King Liu | Tri-gate bulk MOSFET design for improved robustness to random dopant fluctuations | IEEE 2008 Silicon Nanoelectronics Workshop (Honolulu, HI, USA), June 2008. |
| Cheng-Che Hsu, John Hoang, Vu Le, and Jane P. Chang | Feature profile evolution during shallow trench isolation etch in chlorine-based plasmas. II. Coupling reactor and feature scale models | Journal of Vacuum Science B 26(6), 1919 (2008) |
| John Hoang, Cheng-Che Hsu, and Jane P. Chang | Feature profile evolution during shallow trench isolation etch in chlorine-based plasmas. I. Feature scale modeling | Journal of Vacuum Science B |
| T. Mussenbrock,R.P. Brinkmann,M.A. Lieberman, A.J. Lichtenberg, E. Kawamura | Enhancement of Ohmic and stochastic heating by resonance effects in capacitive radio frequency discharges: A theoretical approach | Physical Review Letters Vol. 101, 085004 (2008) |
| Hai-Yan Jin and Nathan W. Cheung | A New Method to Extract Bulk Carrier Mobility in Germanium-on-Insulator | IEEE TRANSACTIONS ON ELECTRON DEVICES, VOL. 55, NO. 5, MAY 2008 |
| Hai-Yan Jin and Nathan W. Cheung | Forming Gas Annealing Characteristics of Germanium-on-Insulator Substrates | IEEE ELECTRON DEVICE LETTERS, VOL. 29, NO. 7, JULY 2008 |
| Ning Ma, Justin Ghan, Sandipan Mishra, Costas Spanos, and Kameshwar Poolla | Automatic hotspot classification using pattern-based clustering | Proc. SPIE / Volume 6925 / Layout Verification, Hotspots, Variations, 2008 |
| D. P. Ceperley, A. R. Neureuther, A. Hawryluk, X. Wang, M. Shen, and Y. Want | Wavelength and Polarization Dependent Absorbtion Effects in Millisecond Annealing of Metal Gate Structures | IEEE Rapid Thermal Processing 2008 Conference |
| D. P. Ceperley and A. R. Neureuther | Engineering Surface Plasmon Grating Couplers through Computer Simulation | JVST B / EIPBN, 2008 |
| A. R. Tao, D. P. Ceperley, P. Sinsermsuksakul, A. R. Neureuther, and P. Yang | Self-Organized Silver Nanoparticles for Three-Dimensional Plasmonic Crystals | Nano Letters, September 2008 |
| Andrew B. Kahng, Chul-Hong Park, Xu Xu, Hailong Yao | Layout Decomposition for Double Patterning Lithography | International Conference on Computer-Aided Design (ICCAD'08) |
| Eric Chin, Andrew Neureuther | ABSTRACT: Variability-aware device and interconnect timing models for double patterning | SPIE Advanced Lithography 2009 |
| Jing Xue, Andrew R. Neureuther, Costas J. Spanos | Printing Assessment and Scatterometry Calibration of Probe Pattern Grating Defocus Monitor | AECAPC 2008 (Best student paper) |
| Hai-Yan Jin, Eric Z. Liu and Nathan W. Cheung | Fabrication and Characteristics of Germanium-On-Insulator Substrates | The 9th International Conference on Solid-State and Integrated-Circuit Technology, October 20-23,2008 |
| E. Kawamura, A.J. Lichtenberg, M.A. Lieberman | Secondary electrons in rf and dc/rf capacitive discharges | Plasma Sources Sci. Technol. v.17 045002 (August 2008) |
| M.A. Lieberman, A.J. Lichtenberg, E. Kawamura, | The effects of nonlinear series resonance on Ohmic and stochastic heating in Capacitive Discharges | Physics of Plasmas v.15, 063505 (June 2008) |
| L.T.-N Wang, W. J. Poppe, L.-T Pang, A. Neureuther, E. Alon, and B. Nikolic | Hyper-sensitive parameter-identifying ring oscillators for lithography process monitoring. | SPIE Symposium on Advanced Lithography 2008 |
| L.T.-N. Wang and A. R. Neureuther | Lateral interactions between standard cells using pattern matching | BACUS 2007 |
| Xin Sun and Tsu-Jae King Liu | Spacer Gate Lithography for Reduced Variability Due to Line Edge Roughness | submitted to the IEEE Transactions on Semiconductor Manufacturing,2009 |
| R. V. Ihnfeldt and Jan B. Talbot | Modeling Material Removal Rates for Copper CMP Using Copper Nanohardness and Etch Rates | Journal of The Electrochemical Society, 155 (8) H582 (2008) |
| Puneet Gupta, Kwangok Jeong, Andrew B. Kahng and Chul-Hong Park | Electrical Metrics forLithographic Line-End Tapering | Photomask Japan 2008 |
| Puneet Gupta, Andrew B. Kahng, Y. Kim, S. Shah, D. Sylvester | Investigation of Diffusion Rounding for Post-Lithography Analysis | IEEE/ACM ASPDAC, 2008 |
| Puneet Gupta, Andrew B. Kahng, Y. Kim, S. Shah, D. Sylvester | Investigation of Diffusion Rounding for Post-Lithography Analysis | IEEE/ACM ASPDAC, 2008 |
| Puneet Gupta, Andrew B. Kahng, Y. kim, S. Shah and D. Sylvester | Shaping Gate Channels for Improved Devices | SPIE Advanced Lithography Symposium, 2008 |
| Andrew R. Neureuther | If it Moves, Simulate It! | SPIE Symposium on Advanced Lithography 2008, 6924-1 |
| Marshal Miller, Andrew Neureuther, Daniel Ceperley, Koji Kikuchi | Impact of photomask quadrature edge effects through focus | SPIE Symposium on Advanced Lithography 2008 |
| Eric Chin and Andrew Neureuther | Modeling Timing Across the Lithographic Process Window | SPIE Symposium on Advanced Lithography 2008 |
| Kun Qian, Costas J. Spanos | A Comprehensive Model of Process Variability for Statistical Timing Optimization | SPIE Symposium on Advanced Lithography 2008 |
| Qian Ying Tang, Costas J. Spanos | Layout Optimization based on a Generalized Process Variability Model | SPIE Advanced Lithography 2008 |
| Insook Lee, D.B. Graves, and M.A. Lieberman | Modeling electromagnetic effects in capacitive discharges | Plasma Sources Sci. Technol. vol. 17, 015018 (16pp), 2008 |
| R. V. Ihnfeldt and J. B. Talbot | Modeling Copper CMP Material Removal Rates Using Copper Surface Nanohardness | 213th Meeting of the Electrochemical Society, Phoenix, Arizona, May 18-23, 2008. |
| R. V. Ihnfeldt and J. B. Talbot | Effect of CMP Slurry Chemistry on Copper Surface Nanohardness | Journal of the Electrochemical Society, vol. 155, pg.6 (2008). |
| Kedar Patel, Tsu-Jae King Liu, Costas Spanos | Impact of Line Edge Roughness on Double-Gate FinFET Performance Variability | SPIE Symposium on Advanced Lithography 2008 |
| Juliet Rubinstein, Andrew R. Neureuther | Images in Photoresist for Self-Interferometric Electrical Image Monitors | BACUS 2007 |
| S. Tripathi, L. Wang F. M. Doyle, and D. A. Dornfeld | AFM and EQCM study of copper in CMP slurry constituents | International Conference on Planarization/CMP Technology, Foster city, CA, Oct 12-13,2006 (Poster Presentation) |
| S. Tripathi, A. Monvoisin, F. M. Doyle, and D. A. Dornfeld | CMP Modeling as a part of Design for Manufacturing | Proceedings of International Conference on Planarization/CMP Technology, Dresden Germany, Oct 25-26, 2007 |
| Shantanu Tripathi, Fiona Doyle, David Dornfeld | Properties and Mechanical Response of Passive Films formed during Copper CMP | Presented at MRS 2007 Spring Meeting, San Francisco, CA, April 2007 (Abstract) |
| Wojtek Poppe,Patrick Au, Darshana Jayasuriya, and Andrew Neureuther | Database and Data Analysis Strategy for Multi-Designer Testchips | BACUS (SPIE Photomask conference), 2007 |
| Marshal Miller, Andrew Neureuther, Daniel Ceperley, Juliet Rubinstein, Koni Kikuchi | Characterization and monitoring of photomask edge effects | BACUS 2007 |
| E. Kawamura, M.A. Lieberman, A.J. LIchtenberg, E.A. Hudson | Capacitive Discharges Driven by Combined DC/RF Sources | Journal of Vacuum Science and Technology A, vol. 25, p. 1456 (S/Oct. 2007) |
| Paul Friedberg, Willy Ceung, George Cheng, Qian Ying Tang, Costas J. Spanos | Modeling Spatial Gate Length Variation in the 0.2um to 1.15mm Separation Range | SPIE 2007 |
| Jing Xue, Costas J. Spanos, and Andrew R. Neureuther | Printing Assessment of Parameter Specific Phase-Shift-Mask Patterns for Scatterometry Monitoring (Abstract) | SPIE Symposium on Advanced Lithography 2008 |
| Jing Xue, Yu Ben, Chaohao Wang, Marshal Miller, Costas J. Spanos and Andrew R. Neureuther | Parameter Sensitive Patterns for Scatterometry Monitoring | SPIE BACUS 2007 |
| Jing Xue, and Costas J. Spanos | An intergrated Aerial Image Sensor for Lithography Diagnostics | International workshop on electron devices and semiconductor technology (IEDST), 2007 |
| Jing Xue, Kurt Moen, Costas Spanos | Integrated aerial image sensor: design, modeling and assembly | J. Vac. Sci. Technol., B 24(6), pp3088, 2006 |
| Yu Ben, Jing Xue and Costas J. Spanos | Using Dual-pitch Gratings for Optical System Characterization through Scatterometry | SPIE Symposium on Advanced Lithography 2008 |
| R. V. Ihnfeldt and J. B. Talbot | Modeling of Copper CMP Using the Colloidal Behavior of an Alumina Slurry with Copper Nanoparticles | Journal of the Electrochemical Society, 154, (12) H1018 (2007) |
| R. V. Ihnfeldt and J. B. Talbot | Copper CMP Removal Rate Predictions Using Alumina Agglomerate Size Distributions | VLSI Multilevel Interconnection Conference (VMIC), September 25-27, 2007, Fremont, California |
| Juliet Rubinstein, Andrew R. Neureuther | ABSTRACT: Images in Photoresist for Self-Interferometric Electrical Image Monitors | BACUS 2007 |
| Cain, J.P., Naulleau, P.P., Gullikson, E. M., and Spanos, C.J. | Lithographic Characterization of the Flare in the Berkeley 0.3 Numerical Aperture Extreme Ultraviolet Microfield Optic | J. Vac. Sci. Technol. B, v. 24, n. 3, pp. 1234-7, May/June 2006 |
| R. Ihnfeldt and J. B. Talbot | Copper Removal Rate Predictions Using Alumina Agglomerate Size Distribution and Copper Nanohardness Measurements | International Conference on Planarization/CMP Technology, Foster city, CA, Oct 12-13, 2006 |
| Qiaolin Zhang, C. Tang, J. Cain, A. Hui, T. Hsieh, N. Maccrae, B. Singe, K. Poolla, and C. Spanos | Across-wafer CD uniformity control through lithography and etch process: experimental verification | Proceedings of SPIE vol. 6518, 2007 |
| Qian Ying Tang, Paul Friedberg, George Cheng, and Costas J. Spanos | Circuit size optimization with multiple sources of variation and position-dependent correlation | Proceedings of SPIE vol. 6521, 2007 |
| Paul Friedberg, Willy Cheung, George Cheng, Qian Ying Tang, and Costas J. Spanos | Modeling spatial gate length variation in the 0.2um to 1.15mm separation range | Proceedings of SPIE vol. 6521, 2007 |
| Cain, J.P., Naulleau, P.P., Gullikson, E. M., and Spanos, C.J. | Lithographic Characterization of the Flare in the Berkeley 0.3 Numerical Aperture Extreme Ultraviolet Microfield Optic | J. Vac. Sci. Technol. B, v. 24, n. 3, pp. 1234-7, May/June 2006. |
| E. Chin, J. Holwill, and A. Neureuther | Prediction of Interconnect Delay Variations Using Pattern Matching | Proceedings of the SPIE, vol 6521(16), 2007. |
| Juliet Holwill, Andrew R. Neureuther | DRC and Mask Friendly Pattern and Probe Aberration Monitors | SPIE 2007 |
| R. Ihnfeldt and J. B. Talbot | Effects of CMP Slurry Chemistry on Agglomeration of Alumina and Copper Surface Hardness | The 210th Meeting of the Electrochemical Society, Cancun, Mexico, Oct. 29-Nov. 3, 602, 1147 (2006). |
| Alan C.F. Wu, M.A. Lieberman, and J.P. Verboncoeur | A Method for Computing Ion Energy Distributions for Multifrequency Capacitive Discharges | Journal of Applied Physics, vol. 101, 056105 (2007) |
| Sungjin Kim, Zhuwen Zhou, M.A. Lieberman, and A.J. Lichtenberg | Relaxation Oscillations in a Capacitive Discharge Chamber Connected to a Peripheral Grounded Chamber | Journal of Applied Physics, vol. 100, 103302 (2006) |
| J.Choi,S.Tripathi,D.Hansen, and D.A.Dornfeld | Chip Scale Prediction of Nitride Erosion in High Selectivity STI CMP | Proceedings of 2006 CMP-MIC, Fremont,CA,2006 |
| J.Choi, D.A.Dornfeld and D.Hansen | Integrated Model-based Simulation for HDP-CVD Topography and Highly Selective CMP for STI Process Optimization | International Conference on Planarization/CMP Technology, Foster city,CA,Oct 12-13,2006 |
| Gregory McIntyre | Characterizing Polarized Illumination in High Numerical Aperture Optical Lithography with Phase Shifting Masks | UC Berkeley Ph.D. Dissertation, May 2006 |
| Gregory McIntyre, Garth Robins, and Andrew Neureuther | Phase shifting mask as a precision instrument for characterizing image-forming optical systems | SPIE Optics and Photonics, Aug 2005 |
| Gregory McIntyre, Andrew Neureuther, Venu Vellenki and Patrick Reynolds | Experimental verification of PSM Polarimetry: Monitoring polarization at 193nm high-NA with phase shift masks | SPIE Microlithography, Feb 2006 |
| Gregory McIntyre and Andrew Neureuther | The effect of the photomask on multiphase shift test monitors | SPIE (BACUS), Sept 2006 |
| Gregory McIntyre and Andrew Neureuther | PSM Polarimetry: Monitoring polarization at 193nm high-NA and immersion with phase shifting masks | Journal of Microlithography, Microfabrication, and Microsystems, vol. 4(3) (Jul-Sep 2005) |
| Greg McIntyre, Juliet Holwill, Andrew Neureuther, Luigi Capodieci, Yi Zou, Harry Levinson, and Jongwook Kye | Screening layouts for high-NA polarization effects using pattern matching | J. Vac Sci. Technol. B, vol. 23(6) (Oct 2005) |
| Gregory McIntyre and Andrew Neureuther | Phase shift mask interferometric birefringence monitor | Journal of Vacuum Science and Technology (EIPBN 2006) |
| Gregory McIntyre, Jongwook Kye, Harry Levinson, and Andrew Neureuther | Polarization Aberrations in ultra high numerical aperture projection printing: A comparison of various representations | Journal of Microlithography, Microfabrication, and Microsystems, vol. 5(3) (Jul-Sep 2006) |
| Qiaolin(Charlie) Zhang, Kameshwar Poolla, Costas Spanos | Across Wafer Post Etch CD Uniformity Enhancement through Model Based Control | AEC/APC 2006 |
| H. Bracht, H.H. Silvestri, I.D. Sharp, and E. E. Haller | Self- and foreign-atom diffusion in semiconductor isotope heterostructures Part II: Experimental results for silicon | Physical Review B (Condensed Matter and Materials Physics), vol. 75, pp. 035211, 2007 |
| Jing Xue, Kurt Moen, Costas Spanos | Integrated aerial image sensor: Design, modeling, and assembly | accepted by JVST B 2006 |
| Sungjin Kim, Lieberman MA, Lichtenberg AJ, Gudmundsson JT | Improved volume-averaged model for steady and pulsed-power electronegative discharges | Journal of Vacuum Science and Technology A, Vol.24, 2025 (2006) |
| Eric Liu, Vorarda Loryuenyong, and Nathan W Cheung | Recent Progress of Heterogeneous INtegration for Semiconductor Materials and Microsystems | Proceedings of 8th International Conference on Solid-State and Integrated Circuit Technology, C2.1 (2006) |
| Vorrada Loryuenyong and Nathan W Cheung | Si and SiO2 layer transfer induced by residual mechanical stress | Applied Physics Letters, 88, 132103 (2006) |
| Vorrada Loeyuenyong | Paste-and-Cut Integration of Advanced Semiconductor Materials | UC Berkeley Ph.D. Thesis 2006 |
| Cheng-Che Hsu, MA Nierode, JW Coburn and DB Graves | Comparison of model and experiment for Ar, Ar/O2, and Ar/O2/Cl2 inductively coupled plasmas | J. of Physics D (July 2006) |
| Juliet Holwill, Andrew R. Neureuther | Self Interferometric Electrical Image Monitors | SPIE 2006 |
| Juliet Holwill, Gregory McIntyre, Wojtek Poppe and Andrew R. Neureuther | Layout 'Hot Spots' for Advancing Optical Technologies | SPIE 2006 |
| R. Ihnfeldt and J. B. Talbot | The Effects of Copper CMP Slurry Chemistry on the Colloidal Behavior of Alumina Abrasives | Journal of the Electrochemical Society, 153, 11 G948 (2006) |
| P Chabert, J-L Raimbault, P Levif, J-M Rax, and M A Lieberman | Inductive heating and E to H transitions in high frequency capacitive discharges | Plasma Sources: Science and Technology vol. 15, pp. S130-S136, (April 2006) |
| M A Lieberman, A J Lichtenberg, Sungjin Kim, J T Gudmundsson, D L Keil, and Jisoo Kim | Plasma ignition in a grounded chamber connected to a capacitive discharge | Plasma Sources Sci. Technol. 15 (2006) 276-287 |
| E. Kawamura, M. A. Lieberman, and A. J. Lichtenberg | Stochastic heating in single and dual frequency capacitive discharges | Physics of Plasmas, vol. 13, p. 053506 1-14, (May 2006) |
| Shantanu Tripathi, Fiona Doyle, David Dorfeld | Tribo-Chemical Modeling of Copper CMP | VMIC 2006 |
| H H Silvestri, H Bracht, J Lundsgaard Hansen, A Nylandsted Larsen and E E Haller | Diffusion of silicon in crystalline germanium | Semicond. Sci. Technol. 21 758-762 (April 2006) |
| P. Chabert, J.-L. Raimbault, P. Levif, J.-M. Rax, and M.A. Lieberman | Inductive Heating and E to H Transitions in Capacitive Discharges | Physical Review Letters, vol. 95, 205001 (2005) |
| Ling Wang and Fiona M. Doyle | Use of an Electrochemical Quartz Crystal Microbalance (EQCM) to Elucidate the Adsorption of Glycine and Hydrogen Peroxide on Copper Surfaces | Proceedings Tenth International Conference on Chemical-Mechanical Polish (CMP) Planarization for ULSI Multilevel Interconnections, February 22-25, 2005 |
| Hartmut A. Bracht, Hughes H. Silvestri, and Eugene E. Haller | Advanced Diffusion Studies with Isotopically Controlled Materials | Solid State Comm. 133, 727-35 (2005) |
| H. H. Silvestri, E.E. Haller, H. Bracht, J. Lundsgaard Hansen, A. Nylandsted Larsen | Diffusion of Silicon in Germanium | Proc. 27th Intl. Confr. on the Physics of Semiconductors (ICPS-27), July 26-30, 2004, Flagstaff, AZ; J. Menéndez and C. G. Van de Walle, eds., AIP Confr. Proc. 772, 97-8 (2005). |
| Jing Xue, Kurt Moen, and Costas Spanos | Integrated Aerial Image Sensor: Concept, Design and Modeling | AEC/APC 2005 |
| Jing Xue, Costas Spanos | Design of an integrated aerial image sensor | Proc. of SPIE, Vol. 5752, pp.392, 2005 |
| Qiaolin Zhang, Paul Friedberg, Kameshwar Poolla, Costas Spanos | Enhanced Spatial PEB Uniformity through a Novel Bake Plate Design Plate Design | AEC/APC XVII 2005. (Win Best Student Paper Award ) |
| Sunghoon Lee ,Hyoungjae Kim, and David Dornfeld | Development of a CMP pad with controlled micro features for improved performance | 2005 International Symposium of Semicoductor Manufacturing |
| Qiaolin Zhang, Kameshwar Poolla, Costas J. Spanos | Modeling of Mask Thermal Distortion and Its Dependency on Pattern Density | Photomask Japan 2005 |
| Eric Z.X.Liu, Vorrada Loryuenyong, Nathan W. Cheung;B.Schmidt,P.Chen,S.S. Lau | layer transfer and characterization of SOI and GeOI substrates | 8th international symposium on semiconductor wafer bonding: science,technology and applications,ECS meeting,May15,2005 |
| Jihong Choi and D.A.Dornfeld | Chip Scale Topography Evolution Model for CMP Process Optimization | Proc. of International Syposium on Semicondutor Manufacturing (ISSM) 2005, Sept 13-15, San Jose, CA |
| Gregory R. McIntyre, Juliet Holwill, Andrew Neureuther, Luigi Capodieci, Yi Zou, Harry Levison, Jongwook Kye | Screening Layouts for High-NA Polarization Effects Using Pattern Matching | EIPBN May 2005 |
| Andrew R. Neureuther, G. Robins, and G. McIntyre | Phase-Shifting Mask Technology as a Precision Instrument for Diagnosis and Control in Ophthalmology | ARVO 2005 (slides only) |
| A.R. Neureuther, R.F.W. Pease, L. Yuan, K. Baghhani Parizi, H. Esfandyarpour, W.J. Poppe, J.A. Liddle and E.H. Anderson | Shot noise models for sequential processes and the role of lateral mixing | EIPBN May 05 |
| Garth Charles Robins | Interferometric Pattern and Probe-Based Aberration Monitors | dissertation |
| Qiaolin Zhang, Cherry Tang, Tony Hsieh, Nick Maccrae,Bhanwar Singh, Kameshwar Poolla, Costas Spanos | Comprehensive CD Uniformity Control across Lithography and Etch | SPIE 2005 Microlithography |
| Greg McIntyre, Andrew Neureuther | PSM Polarimetry: Monitoring Polarization at 193nm High-NA and Immersion with Phase Shifting Masks | SPIE Microlithography 2005 |
| Jihong Choi, D.E.Lee and D.A.Dornfeld | In-Situ Acoustic Emission Monitoring of Surface Chemical Reactions for Copper CMP | 2005 Proc.of CMP for ULSI Multilevel Interconnection Conference (CMP-MIC), Feb 23-25, 2005,Fremont, CA |
| Sunghoon Lee, Hyoungjae Kim, David Dornfeld | Performance of a novel controlled-contact area pad for CMP | 2005 Electrochemical Society spring meeting, Quebec, Canada, May 2005 |
| Sunghoon Lee, Hyoungjae Kim, David Dornfeld | Design rules for CMP pad based on pad-characterization and its prototype fabrication using micro molding | 2005 CMP-MIC, Fremont, Feb, 2005 |
| Paul Friedberg | Modeling Within-Die Spatial Correlation Effects for Process-Design Co-Optimization | |
| H. H. Silvestri, I. D. Sharp, H. Bracht, J. Hansen, A. Nylandsted-Larsen, and E. E. Haller | “Simultaneous Phosphorus and Si Self-Diffusion in Extrinsic Silicon Isotopically Controlled Heterostructures” | MRS Spring 2004 Symp. C, talk C3.3, April 12-16, 2004, San Francisco; Mat. Res. Soc. Symp. Proc. Vol. 810, 77-83 (2004). |
| Greg McIntyre, Andrew Neureuther | Monitoring Polarization and High NA with Phase Shifting Masks: Radial Phase Grating | J. Vac. Sci. Tech, B (EIPBN) |
| Greg McIntyre, Andrew Neureuther | Initial Experimental Verification: Characterizing Tool Illumination and PSM Performance with Phase Shifting Masks | SPIE Microlithography, 2004 |
| Patrick Naulleau, Kenneth A. Goldberg, Erik Anderson, Jason P. Cain, Paul Denham, Keith Jackson, Anne-Sophie Morlens, Seno Rekawa, Farhad Salmassi | Extreme ultraviolet microexposures at the Advanced Light Source using the 0.3 numerical aperture micro-exposure tool optic | Journal of Vacuum Science and Technology B |
| Ling Wang and Fiona M. Doyle | Application of an Electrochemical Quartz Crystal Microbalance (EQCM) to Study the Interaction between Copper and Copper CMP Slurry Components | 9th CMP Users Group Annual Symposium, San Jose, CA |
| Jihong Choi, David Dornfeld | Modeling of Pattern Density Dependent Pressure Non-uniformity at a Die Scale for ILD Chemical Mecanical Planarization | Proceedings of 2004 MRS Spring meeting |
| Ling Wang and Fiona M. Doyle | Known effects of pattern characteristics on copper CMP and future directions | Ninth International Conference on Chemical-Mechanical Polish (CMP) Planarization for ULSI Multilevel Interconnections, Marina Del Rey, California |
| Sunghoon Lee, David Dornfeld | Micro feature pad development and its performance | 2004 MRS spring meeting |
| Sunghoon Lee, David Dornfeld | PAD CONTACT AREA CHARACTERIZATION IN CHEMICAL MECHANICAL PLANARIZATIONUSING MICRO MOLDING TECHNOLOGY | 18th American Society of Precision Engineering |
| Serdar Aksu, Ling Wang and Fiona M. Doyle | Effect of hydrogen peroxide on the oxidation of copper in CMP slurries containing glycine | Journal of the Electrochemical Society, 150 (11) (2003) pp. G718-G723. |
| Hughes Silvestri and Eugene Haller | Simultaneous Phosphorus and Si Self-Diffusion in Extrinsic, Isotopically Controlled Silicon Heterostructures | Materials Research Society, Spring 2004 Proceedings |
| P. Chabert, J.L. Raimbault, J.M. Rax, and M.A. Lieberman | Self-Consistent Nonlinear Transmission Line Model of Standing Wave Effects in a Capacitive Discharge | Physics of Plasmas, vol. 11, no. 5, pp. 1775-85, May 2004 |
| Qiaolin(Charlie) Zhang, Paul Friedberg, Cherry Tang, Bhanwar Singh, Kameshwar Poolla, Costas Spanos | Across-wafer CD Uniformity Enhancement through Control of Multi-zone PEB Profiles | Microlithography, SPIE 2004 |
Member Publications